Manufacturer: Physical Electronics, USA

The VersaProbe III is a highly versatile, multi-technique instrument with PHI’s patented, monochromatic, micro-focused, scanning X-ray source.  The instrument offers a true SEM-like ease of operation with superior micro area spectroscopy and excellent large area capabilities. The fully integrated multi-technique platform of the VersaProbe III offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities.  These features are essential in studying today’s advanced materials and in supporting your material characterization and problem-solving needs.

Features of the VersaProbe III

 - New SmartSoft Software for VersaProbe III

- Micro-focused X-ray source for SEM like navigation and operation

- Optimized configuration and multiple options for thin film depth profile analysis

- Flexible monatomic Ar ion beam

- Cluster ion guns available: GCIB with New cluster size measurement tool and C60

- Excellent Auger performance providing high energy resolution and good signal to noise

-Complete electronic band structure characterization:

- UPS with high sensitivity and energy resolution

- New Low Energy Inverse Photoemission Spectroscopy (LEIPS)

- Reflection Electron Energy Loss Spectroscopy (REELS)

- Analyzer input lens with high sensitivity for all analysis conditions

- Multichannel detector for fast elemental and chemical imaging

- Unique Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements

- New StrataPHI software for thin-film structure analysis

- Fully integrated multi-technique system with optional accessories:

- Hot/cold stage

- 4-contact sample mount for in-situ electrochemical experiments

- Transfer vessel: easy loading of samples under inert atmosphere from glove box or under vacuum